Sputtering Ion Pump

The SIP series sputtering ion pump captures gas by ionising it and burying the ions in a sputtered getter film, producing extremely clean ultra-high vacuum with no moving parts. It maintains at least 85% of nominal pumping speed at 1×10⁻⁷ Pa and reaches extreme-high vacuum down to about 3.6×10⁻¹⁰ Pa in testing, with high-voltage-resistant insulation, an anti-corrosion coating and bake-out up to 300 °C. It is used in particle accelerators, electron microscopy, semiconductor tools, space simulation and vacuum coating, with speeds from 15 to 1,000 L/s.